Chitosan-based films with selected moisturizing additives
 
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Nicolaus Copernicus University in Torun, Faculty of Chemistry, Laboratory for Functional Polymeric Materials, Gagarin 7, 87-100 Torun, Poland
 
 
Submission date: 2025-07-10
 
 
Acceptance date: 2025-08-14
 
 
Publication date: 2025-08-19
 
 
Corresponding author
Beata Kaczmarek-Szczepańska   

beata.kaczmarek@umk.pl
 
 
Engineering of Biomaterials 2025;(173):09
 
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ABSTRACT
This study presents the development and characterization of thin films based on chitosan, modified with selected moisturizing additives, including hyaluronic acid, snail mucus extract, natural moisturizing factor (NMF), and gluconolactone, chosen for their common application in skin care products. Chitosan was dissolved in 0.1 M acetic acid to prepare a 1% w/v solution, and each additive was incorporated at 10% w/w relative to the chitosan content, both individually and in combination. The resulting mixtures were cast and dried under ambient conditions to form flexible films. Comprehensive characterization was performed using Fourier Transform Infrared Spectroscopy (FTIR), atomic force microscopy (AFM), contact angle measurements, and mechanical testing. The results revealed significant differences in chemical interactions, surface morphology, wettability, and mechanical behavior depending on the additive used. Notably, the formulation combining all moisturizing agents exhibited the most favorable balance of mechanical strength, flexibility, and hydration-related surface characteristics. FTIR spectra indicated molecular-level interactions between chitosan and the additives, particularly through hydrogen bonding. AFM analysis showed variations in surface roughness, while contact angle measurements highlighted changes in surface energy and hydrophilicity. These findings indicate that the modified chitosan films are promising candidates for innovative, sustainable dermatological and cosmetic applications, especially for effective skin hydration and use in skin care products.
eISSN:3071-7825
ISSN:1429-7248
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